Since 2021, Wuxi DIS has grasped the development opportunities of the industry and achieved high performance growth while successfully implementing two rounds of financing and investing about 2 billion RMB in Wuxi Hi-tech Zone to build a high-end mask project. With the strong support of all relevant departments in Wuxi Hi-Tech Zone, the project commenced in November 2022, and after 18 months, it has successively completed major milestones such as roofing of the plant, moving in of equipment, debugging of processes, and throughput of production lines, etc. In the second half of 2024, Wuxi DIS will focus on the 90nm mass production, complete the 40nm mass production by 2025, and realise the 28nm upgrading by 2026, so as to continue to enhance its core competitiveness. After the project reaches production, an additional 90nm process will be added. After the project reaches production, the capacity of 90nm-28nm high-end mask plate will be increased by 2,000 pieces/month, and the total capacity will reach 5,000 pieces/month.

At the ceremony of ‘DIS high-end mask through the line and the successful delivery of the first set of 90nm products’, Lv Jian, General Manager of Wuxi DIS, said, ‘Mask plate manufacturing is a key link in the semiconductor industry chain, and it is the link connecting the chip design and manufacturing, and the domestication rate of high-end semiconductor mask is low, and there is a big space for growth. Promoting the construction of high-end mask project is conducive to giving full play to the important roles of ‘making up for short boards’, ‘forging long boards’ and ‘filling in the gaps’, igniting the engine of high-quality development with new quality productivity, and Further consolidate the position of DIS as a leader in the IC mask segment.’